Comparative Study of Zeolite L Etching with Ammonium Fluoride and Ammonium Bifluoride Solutions

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15 صفحه اول

Etching of Silicon in Fluoride Solutions

14 The development and status of what is commonly called the Gerischer mechanism of silicon etching in 15 fluoride solutions is reviewed. The two most widely used and studied wet etchants of silicon are F 16 and OH . Their mechanisms of atom removal share many things in common; in particular, chemical pas17 sivation by a hydrogen-terminated surface plays an important role in both. Crucially, ho...

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ژورنال

عنوان ژورنال: Advanced Materials Interfaces

سال: 2020

ISSN: 2196-7350,2196-7350

DOI: 10.1002/admi.202000348